Gaspurification
GC gas purity is essential in any application requiring extreme sensitivity: Gases should be free from oxygen and water because column damage or excessive baseline noise can result; contamination in the form of hydrocarbons causes ghost peaks. To improve column performance and validity of analytical data, gas purification should be located at the "point of use", i.e. directly in front of the gas chromatograph.
We offer two different systems:
- high temperature adsobent with high capacity to purify nitrogen or helium (VICI purifier)
- filter cartridges, tailor-made for the individual application with a single GC system (Super-Clean™ gas filter system)
Gas Purifier
This system removes impurities by means of chemisorption at a non-evaporable gettering alloy.The Valco purifiers have been designed to operate at a fixed temperature gradient (inlet: 380 - 400 °C, outlet: 170 - 190 °C) which yields a long life span and high efficiency and ensures that any hydrogen generated will be trapped. Two different purifiers for nitrogen and helium (and other noble gases, such as Ar, Ne, Kr, and Xe) are available.
max. flow rate: | 1000 ml/min |
puritiy (based on 5.0 grade gas): | impurities < 10 ppb, based on |
N2-Purifier: | H2O, H2 , O2 , NO, NH3 , CO, CO2 (other impurities removed include CF4, CCl4, SiH4, and light hydrocarbons) |
He-Purifier: | H2O, H2 , O2 , N2 , NO, NH3 , CO, CO2 , CH4 (other impurities removed include CF4 , CCl4 , SiH4 , and light hydrocarbons) |
gas purification system | gases purified | order no. |
Gaspurifier NP2-220 | Nitrogen | V 1500 02 20 |
replacement getter assembly | Nitrogen | V 1500 00 01 |
gaspurifier HP2-220 | Helium (and other noble gases) | V 1501 02 20 |
replacement getter assembly | Helium | V 1501 00 01 |